Sina FeCrAl 0cr23al5 elementum calefactionis planae filum & habena per officinas Fabrica et Factory |TANKII

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FeCrAl 0cr23al5 elementum plana calefactio filum & habena per officinam

Description:

materiam;fecral

latitudo;4-250mm

Crassitudo;0.05-3mm

vexillum;GB/T 1234-2012

resistentia:1.35±0.05μΩ.m

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0cr23al5 elementum calefactionis planae filum &spoliareper officinam

Gradus	0Cr23Al5
Magnitudo	crassities: 0.05-3mm width:4-250mm
Superficies	clara slitting
Pondus	1-3kg / volumine, secundum clientium quantitas
Resistentia	1.3±0.05µΩ.m
Duritia (HV)	180-210HV
Prolongatio	≥16%

Gradus	Summa temperatus	Resistentia	duritia	Distrahentes fortitudo	Prolongatio
0Cr13Al4	1050℃	1.25±0.05µΩ.m	180-210HV	≥550N/mm²	≥16
0Cr15Al5	1100℃	1.3±0.05µΩ.m	180-210HV	≥550N/mm2	≥16
0Cr21Al6Nb	1300℃	1.42±0.05μΩ.m	200-240HV	750N/mm2	≥12
Cr20Ni80	1200℃	1.09±0.05μΩ.m	180-220HV	750N/mm2	≥20
Cr15Ni60	1150℃	1.12±0.05μΩ.m	175-210HV	750N/mm2	≥20
Cr20Ni35	1100℃	1.04±0.05μΩ.m	180-220HV	750N/mm2	≥20
Cr25Ni20(310S)	1100℃	0.86±0.05μΩ.m	180-220HV	750N/mm2	≥20

Gradus	Chemical composition%
	C	P	S	Mn	Si	Cr	Ni	Al	Fe
	≤				Si	Cr	Ni	Al	Fe
0Cr15Al5	0.04	0.02	0.01	0.3	≤0.5	13-14	1	4.8-5.0	statera
0Cr21Al6Nb	0.05	0.024	0.02	0.5	≤0.6	21-23	≤0.6	5-7	statera
0Cr13Al4	0.04	0.02	0.01	0.3	≤0.5	13-14	1	4.8-5.0	statera
Cr20Ni80	0.08	0.02	0.014	0.6	0.75-1.6	20-23	statera	0.5	≤1.0
Cr15Ni60	0.08	0.02	0.014	0.6	0.75-1.6	15-18	55-61	0.5	statera
Cr20Ni35	0.08	0.02	0.014	1.0	1-3	18-21	34-37	.	statera
Cr25Ni20	0.08	0.041	0.03	2.0	0.4-0.6	24-26	19-22	.	statera

Shanghai Tankii ALloy Material Co.,Ltd.versari in productione nichrome mixturae, filum thermocouple, stannum fecrale, subtilitas mixturae, aenei nickel mixturae, imbre thermarum mixturae etc. in forma filum, linteum, tape,spoliare, virga et lamina.

Iam ISO 9001 qualitatem systematis certificatorium et approbationem systematis ISO 14001 environmentalis consecuti sumus. Nos integram causam productionis provectae repurgationis, reductionis, frigoris, et caloris tractandi etc. Nos quoque superbe habemus facultatem independentem R&D.

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